Kanti jain biography

Kanti Jain received the Ph.D.

-- UIUC, ECE/Physics, 1975.

Teaching Statement

Professor Jain teaches a graduate-level in-depth course on Micro/Nanolithography, offered in the Fall, and a senior undergraduate/graduate-level course covering the broad scope of advanced microelectronic process technologies, offered in the Spring.

Research Statement

The central theme in our research programs is to advance the state-of-the-art in microelectronic, optoelectronic and microsystem devices by developing and exploiting novel micro/nano-fabrication technologies.

He is the author of the book Excimer Laser Lithography and holds 70 patents. in electrical engineering and solid-state physics from the University of Illinois at Urbana-Champaign in 1975, M.S. from the same institution in 1970, and B.Tech. from 1975 to 1977.

Upon completing his formal education, Jain started a career in industry.

in electrical engineering and solid-state physics from the University of Illinois at Urbana-Champaign in 1975, M.S. from the same institution in 1970, and B.Tech. Today, this technology is used in flat-panel displays and televisions. In the 1990s, he invented and developed the technologies for large-area lithography that are widely used today in the production of high-definition televisions, monitors and displays.

He received the Ph.D.

from 1975 to 1977.

Dr. Jain is a Fellow of the American Association for the Advancement of Science, Life Fellow of the Institute of Electrical and Electronics Engineers, Fellow of the Optical Society of America, Fellow of the SPIE-The International Society for Optical Engineering, and recipient of the Richardson Medal of the Optical Society of America.

These fabrication technologies enable patterning and microstructuring of a variety of organic and inorganic materials -- including semiconductors, polymers, metals, dielectrics and biological materials -- and producing devices, structures and systems previously not deemed possible. (Hons.) from the Indian Institute of Technology, Kharagpur, in 1969.

(Hons.) from the Indian Institute of Technology, Kharagpur, in 1969. To realize cost-effective fabrication of such devices that will make their implementation in a variety of scientific and commercial applications practical, we are developing the necessary combination of novel processes, structures and systems, such as massively parallel maskless nanolithography; high-resolution, conformable lithography on nonplanar surfaces; excimer laser photoablation in a variety of materials; laser processing of semiconductor films to create active devices; large-area lithography for flat and flexible displays; microfluidic devices and biomolecular arrays; and optoelectronics, micro-optics and photonic circuits.

Research Interests

• Micro and nano fabrication technologies
• Optoelectronics, micro-optics, and photonic circuits
• Excimer laser processing technologies for fabrication of displays and microelectronics
• Energy-smart buildings: Optoelectronic envelope technologies for energy efficiency and recycling
• Smart skins: Large-area, integrated, distributed, multifunctional sensors on flexible substrates
• Ultra-high-resolution lithography technologies for nanoscale devices

Honors

• Elected to the U.S.

  National Academy of Engineering, 2009, for "development of high-resolution, deep-ultraviolet excimer laser lithography for microelectronic fabrication."

• Recognized in 50 Years of Laser History Milestones Timeline prepared by APS, IEEE, OSA and SPIE.
• Elected Fellow of the American Association for the Advancement of Science, 2013, for "the invention and development of fundamental manufacturing processes and systems for high-resolution and large-area micro- and nanolithography."
• Recipient of the Richardson Medal of OSA, 2008, for "pioneering contributions to the development of high-resolution optical microlithography technologies, especially for the invention and development of excimer laser lithography and systems for production of microelectronic devices."
• Fellow of IEEE, 2005.
• Fellow of Optical Society of America, 1999.
• Founding Member, Department of Physics Advisory Board, UIUC, 1998-2002.
• Fellow of SPIE, 1993.
• Founder and President of Anvik Corporation, a microelectronics manufacturing systems company; obtained $21 million in external funding.
• Outstanding Innovation Awards by IBM for invention and development of excimer laser lithography, used worldwide for semiconductor chip production, 1985, 1988.
• Holder of 68 patents (65 issued/allowed, 3 pending), including inventions of core lithography technology for production of ICs (see above) and large-area lithography technology widely used in production of flat-panel televisions and displays.
• Member of the Board of Directors of SPIE, 1992-94, and Executive Committee of the Board of Directors of SPIE, 1992, 93.
• SPIE Editor of Microlithography World, a publication of Pennwell Publishing Company in collaboration with SPIE, 1992-2004.
• SPIE Publications Committee Chair, 1992, 93.

Teaching Honors

• Created a new graduate-level course, ECE 510, Micro/Nanolithography: Science, Technology, and Applications.

  In 2008, he received OSA’s David Richardson Medal “for pioneering contributions to the development of high-resolution optical microlithography technologies, especially for the invention and development of excimer laser lithography and systems for production of microelectronic devices.:

Kanti Jain is President and Founder of Anvik Corporation.